![[Argonne Logo]](/images/argonne_header_logo.jpg){kind=logo}
Veeco Evaporator
The Veeco Model VE-775 vacuum evaporator uses a CTI 6 in. cryopump which provides a cleaner and higher vacuum environment for target deposition. This system is used primarily for multiple resistive heating evaporations as well as reduction/distillation of low vapor pressure elements. The steel bell jar has been removed and replaced with a glass bell jar. An evaporation shutter has been installed as well as a high-current feedthrough, which is used with the quartz lamp substrate heater.
Photograph of experimental arrangement for the reduction-distillation of samarium onto 20g/cm2 carbon backing foils.
Listings of various targets produced showing element, thicknesses and method of production for each target.
Element |
Thickness |
Backing |
Thickness |
Method |
|
(ug/cm2) |
|
(ug/cm2) |
|
|
|
|
|
|
Al |
25 |
-- |
-- |
R |
B |
100 |
-- |
-- |
E |
10B |
325 |
Au |
600 |
E |
Be |
12,000 |
-- |
-- |
E |
40Ca |
1500 |
-- |
-- |
R |
Ca |
1500 |
-- |
-- |
R |
116Cd |
500 |
C |
50 |
R |
155Gd |
500 |
-- |
-- |
Ro |
160Gd |
500 |
-- |
-- |
Ro |
76Ge |
200 |
C |
20 |
E |
In |
300 |
C |
40 |
R |
Melamine |
100 |
C |
20 |
R |
Mg |
1000 |
-- |
-- |
R |
Mn+Co+Cu |
10ea |
C |
20 |
R |
142Nd |
400 |
C |
Thin |
E |
150Nd |
1000 |
Au |
15,000 |
E |
Ni |
6500 |
-- |
-- |
R |
58Ni |
750 |
Au |
15 |
R |
58Ni |
50-90 |
C |
20 |
R |
Pb |
50,000 |
-- |
-- |
R |
Pb |
300 |
C |
40 |
R |
206Pb |
1000 |
C |
40 |
R |
105Pd |
1000 |
-- |
-- |
Ro |
110Pd |
1000 |
-- |
-- |
Ro |
194Pt |
200 |
-- |
-- |
E |
p-terphenyl |
200-300 |
-- |
-- |
E |
Sc, 46Ti |
700 |
-- |
-- |
Ro |
Si |
200 |
-- |
-- |
E |
28Si |
20,10 |
C |
10 |
E |
144Sm |
500 |
-- |
-- |
Ro |
148Sm |
1000 |
C |
40 |
Ro |
Sn |
100 |
-- |
-- |
R |
120Sn, 122Sn |
1000 |
Pb |
50,000 |
R |
124Sn |
1000 |
Pb |
50,000 |
R |
Ta |
300,1000 |
-- |
-- |
Ro |
Ta |
300 |
-- |
-- |
E |
130Te |
1000 |
Pb |
25,000 |
R |
Th |
1000 |
-- |
-- |
Ro |
232Th |
130,000/27,000 |
-- |
-- |
Ro |
232Th |
46,000 |
Au |
16 |
Ro |
ThF4 |
1000 |
C |
40 |
R |
ThF4 |
300 |
C |
40 |
R |
Ti |
100-200 |
C |
Thin |
E |
50Ti |
1000 |
Pb |
43,000 |
E |
U |
300 |
C |
40 |
R |
UF4 |
300 |
C |
-- |
R |
182W |
1500 |
-- |
-- |
Ro |
64Zn, 66Zn |
500 |
-- |
-- |
Ro |
R=resistive, E=electron beam and Ro=rolling
G.E. Thomas and J.P. Greene, Nucl. Instr. and Meth. A362 (1995) 201-204.
