Techniques and Capabilities

The target development laboratory includes state-of-the-art equipment used for thin-film fabrication. The available techniques consist of multiple resistive heating, focused ion beam sputtering, glow-discharge plasma deposition, electron beam and electron bombardment evaporation, electro-deposition and mechanical rolling. The evaporators are maintained under high vacuum and each vessel contains a quartz-crystal film-thickness monitor with deposition rate indicators. Also included are movable shutters, quartz-lamp substrate heaters and thermocouple temperature sensors, allowing for complete process monitoring during target deposition.

Vacuum Evaporators

 

Auxiliary Equipment and Techniques

 

intelvac

"The availability of the needed target making capabilities,
and a trained workforce, is a must for successful
experiments at FRIB, and at other accelerators."

Report of the Scientific Advisory Committee, February 20-22, 2010