Techniques and Capabilities

The target development laboratory includes state-of-the-art equipment used for thin-film fabrication. The available techniques consist of multiple resistive heating, focused ion beam sputtering, glow-discharge plasma deposition, electron beam and electron bombardment evaporation, electro-deposition and mechanical rolling. The evaporators are maintained under high vacuum and each vessel contains a quartz-crystal film-thickness monitor with deposition rate indicators. Also included are movable shutters, quartz-lamp substrate heaters and thermocouple temperature sensors, allowing for complete process monitoring during target deposition.

Vacuum Evaporators


Auxiliary Equipment and Techniques



"The availability of the needed target making capabilities,
and a trained workforce, is a must for successful
experiments at FRIB, and at other accelerators."

Report of the Scientific Advisory Committee, February 20-22, 2010