Techniques and Capabilities

The target development laboratory includes state-of-the-art equipment used for thin-film fabrication. The available techniques consist of multiple resistive heating, focused ion beam sputtering, glow-discharge plasma deposition, electron beam and electron bombardment evaporation, electro-deposition and mechanical rolling. The evaporators are maintained under high vacuum and each vessel contains a quartz-crystal film-thickness monitor with deposition rate indicators. Also included are movable shutters, quartz-lamp substrate heaters and thermocouple temperature sensors, allowing for complete process monitoring during target deposition.

Vacuum Evaporators

• Electron Beam Gun
• Veeco Evaporator
• Focused Ion Beam Sputter Source
• Mortar Source
• Glow Discharge Apparatus

Rolling

Electro-deposition

Auxiliary Equipment

• Alpha Particle Counting System
• Target Storage Facility