Focused Ion Beam Sputter Sources

Mounted on a standard feed-through ring for installation within the Veeco VE-775 evaporator is an Ion Tech Model FAB 11NW saddle-field sputter gun. The saddle-field ion source is placed approximately 5 cm from the sputter target and at an angle of 30 degrees.

The backing foil used for the deposition substrate is positioned vertically 2 cm above the sputter target. This mounting system has been used successfully for target production as well as target thinning.

A wide-beam Saddle Field Ion Source, purchased for it's larger beam spot size has enabled the development of new ion milling techniques. A study was recently completed involving the deposition rates obtained with this source for many common target materials. In conjuction with this effort was the use of TRIM calculations for predicting the observed sputter yields. This source provides increased deposition rates for standard target sputtering applications.

Photograph showing the sputtering setup.

Ion beam sputtering deposition rates using Argon.

* from Ref. B11 FINE BEAM SADDLE FIELD ION SOURCE, Information Sheet B, Atom Tech Ltd., Island Farm Ave., West Molesey, Surrey KT8 2UZ, England.

Deposition rates and estimated erosion based on consumption rates for various materials using Krypton.

J. P. Greene and G. E. Thomas, Nucl. Instr. and Meth. A (1997).